w88win优德·(中国)手机版官网

Silicon Nitride Ceramic Substrate Sintering Furnace 先进陶瓷

Horizontal gas press sintering furnace for sintering silicon nitride ceramic substrate

Share with：

Online inquiry and order

details

Use

Mainly used for sintering silicon nitride ceramic substrate.

Main configuration:

1. double layer shell design with built-in water cooling jacket,

furnace shell of 16MnR pressure vessel steel.

2. Heating element of isostatic graphite rod, electric resistance heating.

3 Gas-in system owns relief valve and pressure relay, reliable and safe

4. Automatic control mode of PLC plus touching screen.

5. A fast cooling blower equipped with the end of furnace accelerates the cooling of furnace.

Main technical parameters:

1.Max. temperature：2100℃,

2.Working temperature：2000℃

3.Gas pressure:1MPa.

4. Final vacuum: 1Pa.
5.Working zone：600X600X1400mm（WXHXD）

Furnace can be customized on your request.

— Booking and ordering —

corporate name

Your name

contact number

Product classification

Product name

Message message

Verification Code